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F10600 - SEMI F106 - Test Method for Determination of Leak Integrity of Gas Delivery Systems by Helium Leak Detector Revision:SEMI F106-0308 (Reapproved 1012) - Inactive This Standard was technically approved

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Description

This Standard was technically approved by the Silicon Wafer Global Technical Committee

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The method is based on recording and evaluating near-infrared photoluminescence (PL) radiation emitted from the wafer after excitation with monochromatic light

Wafers must be accurately aligned in various processing equipment during integrated circuit manufacture

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F10600 - SEMI F106 - Test Method for Determination of Leak Integrity of Gas Delivery Systems by Helium Leak Detector Revision:SEMI F106-0308 (Reapproved 1012) - Inactive This Standard was technically approvedThis Standard was technically approved by the global Facilities Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 30, 2012. Available at www. semiviews. org and www. semi. org in October 2012; originally published March 2008. This Document defines the inboard helium leak test method for gas delivery systems. It covers both conventional metal face sealing and surface mount gas

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