C00327 - SEMI C3.27 - 三フッ化ホウ素（BF3），シリンダ充填， 99.0%品質の仕様 StdTpc-Statistical Control Writing accuracy of the mask

Writing accuracy of the mask writing equipment is evaluated by measuring a written mask and is affected greatly by process conditions to be carried out

• the statistical evaluation of the particulate contamination measurement results from the analytical equipment

合成石英（SFS）

13-0698 (first published)

2  This Standard applies to standard size mass flow controllers and mass flow meters

C00327 - SEMI C3.27 - 三フッ化ホウ素（BF3），シリンダ充填， 99.0%品質の仕様 StdTpc-Statistical Control Writing accuracy of the maskglobal Gases Technical Committee2011912global Audits and Reviews Subcommittee201110www. semiviews. org www. semi. org1984200211 : (Si2H6) Referenced SEMI Standards SEMI C1 Specifications for Reagents SEMI C3 Specifications for Gases