F05100 - SEMI F51 - Guide for Elastometric Sealing Technology Revision:SEMI F51-0200 - Superseded inspection criteria

inspection criteria

Epitaxial growth processes are used extensively in the manufacture of silicon electronic devices

use of the equipment requires compliance with stringent safety regulations

SEMI MF951 — Test Method for Determination of Radial Interstitial Oxygen Variation in Silicon Wafers

帯電したウェーハやレチクルの表面は異物を吸着（静電気吸着，またはESA： electrostatic attraction）し，不良率を増やす。また，製品に存在する電荷は，装置故障や製品自体の破壊の原因となることがある。

F05100 - SEMI F51 - Guide for Elastometric Sealing Technology Revision:SEMI F51-0200 - Superseded inspection criteriaThis Standard was technically approved by the Facilities Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on June 28, 2017. Available at www. semiviews. org and www. semi. org in September 2017; originally published February 2000; previously published November 2015. O rings were originally developed for industrial markets and much later for aerospace. Current industry standards do not